Investigation of SiO2 deposition processes with mass spectrometry and optical emission spectroscopy in plasma enhanced chemical vapor deposition using tetraethoxysilane

Thin Solid Films

Volumn 343-344, Issue 1-2, 1999, Pages 148-151

  Horii, Naohiro Maeda ^a   Okimura, Kunio ^a   Shibata, Akira ^a  

^a FUKUI NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

Author keywords

Glow discharge mass spectroscopy; Glow discharge optical spectroscopy; Optical spectroscopy; Plasma processing and deposition; Silicon oxide

Indexed keywords

EMISSION SPECTROSCOPY; MASS SPECTROMETRY; PHOTODISSOCIATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA;

GLOW DISCHARGE MASS SPECTROSCOPY; GLOW DISCHARGE OPTICAL SPECTROSCOPY; TETRAETHOXYSILANE (TEOS);

FILM GROWTH;

EID: 0032623783     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01650-2     Document Type: Article

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