Photoluminescence properties of ZnO thin films prepared by DC magnetron sputtering

Journal of Central South University of Technology (English Edition)

Volumn 15, Issue 4, 2008, Pages 449-453

  Yang, Bing Chu ^a   Liu, Xiao Yan ^a   Gao, Fei ^a   Ma, Xue Long ^a  

^a CENTRAL SOUTH UNIVERSITY   (China)

Author keywords

Magnetron sputtering; Photoluminescence; Zinc vacancy; ZnO thin films

Indexed keywords

ANNEALING; CONCENTRATION (PROCESS); FILM PREPARATION; LIGHT EMISSION; LUMINESCENCE; MAGNETRONS; METALLIC FILMS; NONMETALS; OPTICAL FILMS; OXYGEN; OXYGEN VACANCIES; PARTIAL PRESSURE; PHOTOLUMINESCENCE; REACTIVE SPUTTERING; SEMICONDUCTING ZINC COMPOUNDS; THICK FILMS; THIN FILMS; VACUUM; ZINC ALLOYS; ZINC OXIDE;

DC-MAGNETRON SPUTTERING; DIRECT CURRENT; IN-VACUUM; INTRINSIC DEFECTS; OXYGEN PARTIAL PRESSURES; OXYGEN-VACANCY; PHOTOLUMINESCENCE PROPERTIES; REACTIVE MAGNETRON SPUTTERING; ZINC VACANCY; ZNO THIN FILMS;

MAGNETRON SPUTTERING;

EID: 49649129006     PISSN: 10059784     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11771-008-0084-x     Document Type: Article

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