Chemistry-induced intrinsic stress variations during the chemical vapor deposition of polycrystalline diamond

Journal of Applied Physics

Volumn 96, Issue 6, 2004, Pages 3531-3539

  Rajamani, Ashok ^a   Sheldon, Brian W ^a   Nijhawan, Sumit ^a   Schwartzman, Alan ^a   Rankin, Janet ^a   Walden, Barbara L ^b   Riester, Laura ^c  

^a Brown University   (United States)

^b TRINITY COLLEGE   (United States)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTACT GEOMETRY; CRYSTAL GROWTH MORPHOLOGY; ELASTIC ENERGY; STONEY EQUATION;

CHEMICAL VAPOR DEPOSITION; COALESCENCE; COMPUTATIONAL GEOMETRY; CRYSTAL GROWTH; DEFORMATION; DIAMOND FILMS; ELECTRON ENERGY LOSS SPECTROSCOPY; FILM GROWTH; FINITE ELEMENT METHOD; GRAIN BOUNDARIES; HYDROGENATION; INTERFACIAL ENERGY; MATHEMATICAL MODELS; NUCLEATION; SURFACES; TENSILE STRESS;

POLYCRYSTALLINE MATERIALS;

EID: 4944256327     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1777811     Document Type: Article

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