Reduction of intrinsic stresses during the chemical vapor deposition of diamond

Journal of Materials Research

Volumn 14, Issue 3, 1999, Pages 1046-1054

  Nijhawan, Sumit ^a   Jankovsky, Susan M ^a   Sheldon, Brian W ^a   Walden, Barbara L ^b  

^a Brown University   (United States)

^b TRINITY COLLEGE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; COMPRESSIVE STRESS; CRYSTAL MICROSTRUCTURE; GRAIN BOUNDARIES; STRESS ANALYSIS; TENSILE STRESS; THERMAL EXPANSION; THERMAL STRESS;

BENDING PLATE METHOD; INTRINSIC STRESSES; THERMAL EXPANSION COEFFICIENT;

DIAMOND FILMS;

EID: 0033099046     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1999.0139     Document Type: Article

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