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Volumn 403, Issue 18, 2008, Pages 3105-3109

Investigation of the effects of porous layer on the electrical properties of Pt/n-GaN Schottky contacts

Author keywords

Electroless etching; Porous GaN; Schottky barrier height

Indexed keywords

ELECTRIC PROPERTIES; ELECTROLESS PLATING; GALLIUM ALLOYS; GALLIUM NITRIDE; LEAKAGE CURRENTS; PLATINUM; SCHOTTKY BARRIER DIODES; SEMICONDUCTING GALLIUM; SEMICONDUCTOR METAL BOUNDARIES;

EID: 48749102901     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2008.03.014     Document Type: Article
Times cited : (11)

References (20)
  • 19
    • 48749112003 scopus 로고    scopus 로고
    • http://academic.brooklyn.cuny.edu/physics/tung/Schottky/index.htm
  • 20
    • 0034829281 scopus 로고    scopus 로고
    • H.-L. Hwang, J.-T. Hsieh, M. Pilkuhn, Etching techniques for realization of semiconductor devices based on III-V nitrides, Plenary Speech in 2001 IEEE Hong Kong Electron Devices Meeting.
    • H.-L. Hwang, J.-T. Hsieh, M. Pilkuhn, Etching techniques for realization of semiconductor devices based on III-V nitrides, Plenary Speech in 2001 IEEE Hong Kong Electron Devices Meeting.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.