High-spatial-resolution surface-temperature mapping using fluorescent thermometry

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Volumn 4, Issue 7, 2008, Pages 908-914

  Löw, Peter ^a,b   Kim, Beomjoon ^b   Takama, Nobuyuki ^b   Bergaud, Christian ^a  

^a UNIVERSITÉ DE TOULOUSE   (France)

^b INSTITUTE OF INDUSTRIAL SCIENCE   (Japan)

Author keywords

Fluorescence; Nanowires; Resistive heating; Thermometry

Indexed keywords

CONFORMAL MAPPING; FINITE ELEMENT METHOD; FLUOROPHORES; HEATING; LIGHT EMISSION; LUMINESCENCE; MATHEMATICAL MODELS; NONMETALS; SILICON; SILICON WAFERS; TEMPERATURE MEASURING INSTRUMENTS; TEMPERATURE SCALES; TEMPERATURE SENSORS; THERMOMETERS; THICKNESS MEASUREMENT;

ARBITRARY LAGRANGIAN EULERIAN FINITE ELEMENT (FE) MODEL; FINITE ELEMENT (FE) MODELING; FLUOROPHORE; HEATING STAGE; HIGH-SPATIAL-RESOLUTION; MICRO AND NANOSTRUCTURES; OXIDIZED SILICON WAFERS; RESISTIVE HEATING; RHODAMINE B (RB); SUB MICROMETER SCALE; SUB MICROMETERS; TEMPERATURE CALIBRATION; TEMPERATURE DEPENDENT; TEMPERATURE MAPPING;

FLUORESCENCE;

FLUORESCENT DYE; NICKEL; OXYGEN; RHODAMINE; RHODAMINE B; SILICON;

ARTICLE; CALIBRATION; CHEMISTRY; EQUIPMENT DESIGN; FLUORESCENCE MICROSCOPY; HEAT; HEATING; INFRARED RADIATION; INSTRUMENTATION; METHODOLOGY; MICROSCOPY; POWDER; SURFACE PROPERTY; TEMPERATURE;

CALIBRATION; EQUIPMENT DESIGN; FLUORESCENT DYES; HEAT; HEATING; INFRARED RAYS; MICROSCOPY; MICROSCOPY, FLUORESCENCE; NICKEL; OXYGEN; POWDERS; RHODAMINES; SILICON; SURFACE PROPERTIES; TEMPERATURE;

EID: 48249104321     PISSN: 16136810     EISSN: 16136829     Source Type: Journal    
DOI: 10.1002/smll.200700581     Document Type: Article

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