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Volumn 147, Issue 9-10, 2008, Pages 366-369
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Nanolithography and manipulation of graphene using an atomic force microscope
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Author keywords
A. Graphene; E. Atomic force microscopy; E. Nanolithography
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Indexed keywords
ATOMIC FORCE MICROSCOPY;
ATOMIC PHYSICS;
ATOMS;
CHEMICAL OXYGEN DEMAND;
EXTREME ULTRAVIOLET LITHOGRAPHY;
NANOLITHOGRAPHY;
OPTICAL DESIGN;
OXIDATION;
ATOMIC FORCE MICROSCOPE (AFM);
DEVICE FABRICATIONS;
DIFFERENT SUBSTRATES;
ELSEVIER (CO);
GRAPHENE;
GRAPHENE FLAKES;
GRAPHENE SHEETS;
LENGTH SCALING;
LOCAL ANODIC OXIDATION (LAO);
MECHANICAL PEELING;
SINGLE LAYERS;
ANODIC OXIDATION;
ANODIZATION;
ASSEMBLY;
ATOMS;
LITHOGRAPHY;
MICROSCOPY;
OXIDATION;
PEEL STRENGTH;
PHYSICAL PROPERTIES;
SHEET METAL;
STRUCTURAL ANALYSIS;
SUBSTRATES;
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EID: 48049116880
PISSN: 00381098
EISSN: None
Source Type: Journal
DOI: 10.1016/j.ssc.2008.06.027 Document Type: Article |
Times cited : (147)
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References (34)
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