Tailoring graphite with the goal of achieving single sheets

Nanotechnology

Volumn 10, Issue 3, 1999, Pages 269-272

  Lu, Xuekun ^a   Yu, Minfeng ^a   Huang, Hui ^a   Ruoff, Rodney S ^a  

^a WASHINGTON UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC ARCS; LASER ABLATION; NANOTECHNOLOGY; NANOTUBES; PLASMA ETCHING; REACTIVE ION ETCHING;

HIGHLY ORIENTED PYROLYTIC GRAPHITE (HOPG);

GRAPHITE;

EID: 0032642626     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/10/3/308     Document Type: Article

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6. Oshima C 1998 Private communication
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