Determination of the molecular size of growth species in the AP-MOCVD of ZnO from DEZ and H2O

Journal of Crystal Growth

Volumn 310, Issue 16, 2008, Pages 3837-3842

  Velasco, Angelito ^a   Mitsuji, Hiroshi ^a   Minami, Wataru ^a   Lee, Jeong Ki ^b   Komiyama, Hiroshi ^b   Kim, Hee joon ^a  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

A1. Diffusivity; A1. Growth kinetics; A3. Metal organic chemical vapor deposition; B1. Zinc compounds

Indexed keywords

ATMOSPHERIC PRESSURE; ATMOSPHERICS; HEXANE; ION BEAM ASSISTED DEPOSITION; METALLIZING; METALS; ORGANIC CHEMICALS; ORGANIC COMPOUNDS; PRESSURE; SEMICONDUCTING ZINC COMPOUNDS; VAPOR DEPOSITION; ZINC ALLOYS; ZINC OXIDE;

DIETHYL ZINC (DEZN); GROWTH SPECIES; METAL-ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); MOLECULAR SIZES; N-HEXANE; ZNO FILMS;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 48049094572     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.05.028     Document Type: Article

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