Characteristics of epitaxial ZnO films on sapphire substrates deposited using rf-magnetron sputtering

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 36, Issue 4 A, 1997, Pages 2277-2280

  Kim, Young Jin ^a   Kim, Ki Wan ^a  

^a Kyungpook National University   (South Korea)

Author keywords

Center frequency; rf magnetron sputtering; Sapphire substrate; ZnO films; ZnO SAW filter

Indexed keywords

CENTER FREQUENCIES; SURFACE ACOUSTIC WAVE PROPERTIES; ZINC OXIDE FILMS;

ACOUSTIC SURFACE WAVE FILTERS; AUGER ELECTRON SPECTROSCOPY; EPITAXIAL GROWTH; FILM GROWTH; MAGNETRON SPUTTERING; PIEZOELECTRIC MATERIALS; SAPPHIRE; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

DIELECTRIC FILMS;

EID: 0031122472     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.36.2277     Document Type: Article

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