The effect of thermal annealing on the structural and mechanical properties of a-C:H thin films prepared by the CFUBM magnetron sputtering method

Journal of Non-Crystalline Solids

Volumn 354, Issue 33, 2008, Pages 3980-3983

  Park, Yong Seob ^a   Hong, Byungyou ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

Atomic force and scanning tunneling microscopy; Carbon; Hardness; Mechanical, stress relaxation; Nano clusters; Raman spectroscopy; Sputtering; UPS XPS

Indexed keywords

ACETYLENE; ANNEALING; ARGON; FILM PREPARATION; INERT GASES; LIGHTING; LITHOGRAPHY; MAGNETRONS; MECHANICAL PROPERTIES; STRUCTURAL PROPERTIES; THICK FILMS;

(PL) PROPERTIES; A-C:H FILMS; MAGNETRON SPUTTERING METHOD; SILICON (111) SUBSTRATES; UNBALANCED MAGNETRON (UBM);

MAGNETRON SPUTTERING;

EID: 48049093248     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2008.05.043     Document Type: Article

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