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Volumn 266-269 B, Issue , 2000, Pages 783-787

Comparative study of the effect of thermal annealing on the hydrogen stability and the stress in a-C:H films deposited by electron cyclotron resonance glow discharge and direct current multipolar plasma methods

(4) Benlahsen, M a Racine, B a Clin, M a Zellama, K a

a Universite de Picardie Jules Verne (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0004931969 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/s0022-3093(99)00815-7 Document Type: Article

Times cited : (11)

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