Effect of substrate morphology on growth and field emission properties of carbon nanotube films

Nanoscale Research Letters

Volumn 3, Issue 6, 2008, Pages 205-212

  Srivastava, Sanjay K ^a,b   Vankar, V D ^a   Kumar, Vikram ^b   Singh, V N ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

^b NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

Bamboostructured CNTs (BS CNTs); Carbon nanotubes (CNTs); Chemical vapor deposition (CVD); Field emission; Transmission electron microscopy (TEM)

Indexed keywords

CARBON NANOTUBE (CNT) FILMS; CATALYTIC MATERIALS; CNT FILMS; EMISSION CHARACTERISTICS; ENHANCED EMISSION; FIELD EMISSION (FE) MEASUREMENTS; FIELD EMISSION (FE) PROPERTIES; GROWTH MORPHOLOGIES; INTERNAL STRUCTURES; MICROWAVE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (MPECVD); NANO TUBE; SCANNING AND TRANSMISSION ELECTRON MICROSCOPES; SHARP TIP; SI(2 1 1) SUBSTRATES; SIZE AND SHAPE; STRUCTURAL CHARACTERISTICS; THRESHOLD FIELDS; VERTICALLY ALIGNED;

ACETYLENE; AMMONIA; BAMBOO; CARBON; CARBON FILMS; CARBON NANOTUBES; CHEMICAL PROPERTIES; ELECTRON MICROSCOPES; EPITAXIAL GROWTH; FIELD EMISSION; IRON; LIGHTING; METALLIZING; MICROSCOPES; MICROWAVES; MORPHOLOGY; NANOCOMPOSITES; NANOPORES; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; NANOTECHNOLOGY; NANOTUBES; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; SCANNING; SILICON; SUBSTRATES; THICK FILMS; THIN FILMS; VAPOR DEPOSITION;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 46749133831     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1007/s11671-008-9138-0     Document Type: Article

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