Growth and microstructures of carbon nanotube films prepared by microwave plasma enhanced chemical vapor deposition process

Thin Solid Films

Volumn 515, Issue 4, 2006, Pages 1552-1560

  Srivastava, Sanjay K ^a   Vankar, V D ^a   Kumar, V ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

^b NATIONAL PHYSICAL LABORATORY   (India)

Author keywords

Carbon nanotubes (CNTs); Chemical vapor deposition (CVD); Optical emission spectroscopy (OES); Transmission electron microscopy (TEM)

Indexed keywords

FILM GROWTH; IRON; MICROSTRUCTURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; SILICONE COATINGS; TRANSMISSION ELECTRON MICROSCOPY;

BULK DIFFUSION; DEGREE OF DISORDER; OPTICAL EMISSION SPECTROSCOPY; RADICAL CONCENTRATION;

CARBON NANOTUBES;

EID: 33751237098     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.05.009     Document Type: Article

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