Effects of plasma treatment on microstructure and electron field emission properties of screen-printed carbon nanotube films

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 36, Issue 1, 2007, Pages 28-33

  Feng, Tao ^a   Zhang, Jihua ^a   Li, Qiong ^b   Wang, Xi ^a   Yu, Ke ^b   Zou, Shichang ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^b EAST CHINA NORMAL UNIVERSITY   (China)

Author keywords

Carbon nanotube; Field emission; Plasma treatment; Screen printing

Indexed keywords

CARBON NANOTUBES; MICROSTRUCTURE; PLASMA THEORY; SCANNING ELECTRON MICROSCOPY; SCREEN PRINTING;

EMISSION SITE DENSITY (ESD); FIELD EMISSION PROPERTIES; MICROSTRUCTURAL CHANGES; PLASMA TREATMENT;

THIN FILMS;

MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SILK SCREEN PRINTING; THIN FILMS;

EID: 33845694541     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2006.07.034     Document Type: Article

References (27)

1. Iijima S. Nature (London) 354 (1991) 56
2. Rinzler A.G., Hafner J.H., Nikolaev P., Luo L., Kim S.G., Tomanek D., Nordlander P., Colbert D.T., and Smalley R.E. Science 269 (1995) 1550
3. Collins P.G., and Zettl A. Phys. Rev. B 55 (1997) 9391
4. Gulyaev Yu.V., Chernozatonskii L.A., Kosakovskaja Z.Ya., Sinitsyn N.I., Torgashov G.V., and Zakharchenko Yu.F. J. Vac. Sci. Technol. B 13 (1995) 435
5. de Heer W.A., Chatelain A., and Ugarte D. Science 270 (1995) 1179
6. Choi W.B., Chung D.S., Kang J.H., Kim H.Y., Jin Y.W., Han I.T., Lee Y.H., Jung J.E., Lee N.S., Park G.S., and Kim J.M. Appl. Phys. Lett. 75 (1999) 3129
7. Chung D.S., Park S.H., Lee H.W., Choi J.H., Cha S.N., Kim J.W., Jang J.E., Min K.W., Cho S.H., Yoon M.J., Lee J.S., Lee C.K., Yoo J.H., and Kim J.M. Appl. Phys. Lett. 80 (2002) 4045
8. Han I.T., Kim H.J., Park Y.J., Lee N., Jang J.E., Kim J.W., Jung J.E., and Kim J.M. Appl. Phys. Lett. 81 (2002) 2070
9. Uemura S., Yotani J., Nagasako T., Kurachi H., Yamada H., Ezaki T., and Maesoba T. IDMC2002 (2002) 431
10. Choi W.B., Chung D.S., Kang J.H., Kim H.Y., Jin Y.W., Han I.T., Lee Y.H., Jung J.E., Lee N.S., Park G.S., and Kim J.M. Appl. Phys. Lett. 75 (1999) 3129
11. Kim J.M., Choi W.B., Lee N.S., and Jung J.E. Diam. Relat. Mater 9 (2000) 1184
12. Kim D.H., Kim C.D., and Lee H.R. Carbon 42 (2004) 1807
13. Kim J.S., Ahn K.S., Kim C.O., and Hong J.P. Appl. Phys. Lett. 82 (2003) 1607
14. Vink T.J., Gillies M., Kriege J.C., and van de Laar H.W.J.J. Appl. Phys. Lett. 83 (2003) 3552
15. Lin I.N., Chen Y.H., and Cheng H.F. Diam. Relat. Mater. 9 (2000) 1574
16. Hart A., Satyanarayana B.S., Milne W.I., and Robertson J. Diam. Relat. Mater. 8 (1999) 809
17. Li Q., Xu J.F., Yu K., Zhu Z.Q., Feng T., Wang X., and Liu X.H. J. Vac. Sci. Technol. B 21 (2003) 1684
18. Zhi C.Y., Bai X.D., and Wang E.G. Appl. Phys. Lett. 81 (2002) 1690
19. Kanazawa Y., Oyama T., Murakami K., and Takai M. J. Vac. Sci. Technol. B 22 (2004) 1342
20. Golberg D., Bando Y., Kurashima K., and Sasaki T. Carbon 37 (1999) 293
21. Eklund P.C., Holden J.M., and Jishi R.A. Carbon 33 (1995) 959
22. Zhi C.Y., Bai X.D., and Wang E.G. Appl. Phys. Lett. 80 (2002) 3590
23. Dean K.A., von Allmen P., and Chalamala B.R. J. Vac. Sci. Technol. B 17 (1999) 1959
24. Carroll D.L., Redlich P., Ajayan P.M., Charlier J.C., Blase X., DeVita A., and Car R. Phys. Rev. Lett. 78 (1997) 2811
25. Adessi Ch., and Devel M. Phys. Rev. B 62 (2000) 13314
26. Zhou G., Duan W.H., and Gu B.L. Phys. Rev. Lett. 87 (2001) 095504
27. Zhou G., Duan W.H., and Gu B.L. Appl. Phys. Lett. 79 (2001) 836