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Volumn 6, Issue 2, 2005, Pages 121-128

Mixed hydrazido amido/imido complexes of tantalum, hafnium and zirconium: Potential precursors for metal nitride MOCVD

Author keywords

[No Author keywords available]

Indexed keywords


EID: 46749108501     PISSN: 14779226     EISSN: None     Source Type: Journal    
DOI: 10.1039/b512074h     Document Type: Article
Times cited : (1)

References (34)
  • 5
    • 3042715207 scopus 로고    scopus 로고
    • M. Houssa, Institute of Physics Publishing, Bristol
    • M. Ritala, in High-k Gate Dielectrics, ed. M. Houssa, Institute of Physics Publishing, Bristol, (2004), pp. 17-64.
    • (2004) High-K Gate Dielectrics , pp. 17-64
    • Ritala, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.