Growth and characterization of ZnO films on (0 0 1), (1 0 0) and (0 1 0) LiGaO2 substrates

Journal of Crystal Growth

Volumn 310, Issue 13, 2008, Pages 3144-3148

  Huang, Taohua ^a,b   Zhou, Shengming ^a   Teng, Hao ^a,b   Lin, Hui ^a,b   Wang, Jun ^a   Han, Ping ^c   Zhang, Rong ^c  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c NANJING UNIVERSITY   (China)

Author keywords

A1. Atomic force microscopy; A1. X ray diffraction; B1. LiGaO2 substrate; B2. ZnO films

Indexed keywords

ATOMIC FORCE MICROSCOPY; FILM GROWTH; MAGNETRON SPUTTERING; X RAY DIFFRACTION; ZINC OXIDE;

HEXAGONAL GRAINS; NEAR-BAND-EDGE UV EMISSION PEAK; SUBSTRATE PLANE; ZNO FILMS;

THIN FILMS;

EID: 46549085230     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2008.03.037     Document Type: Article

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