Nonpolar a-plane ZnO films fabricated on (3 0 2)γ-LiAlO2 by pulsed laser deposition

Journal of Crystal Growth

Volumn 303, Issue 2, 2007, Pages 510-514

  Zhou, Shengming ^a   Zhou, Jianhua ^a   Huang, Taohua ^a   Li, Shuzhi ^a   Zou, Jun ^a   Wang, Jun ^a   Zhang, Xia ^b   Li, Xiaomin ^b   Zhang, Rong ^c  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b SHANGHAI INSTITUTE OF CERAMICS   (China)

^c NANJING UNIVERSITY   (China)

Author keywords

A1. Atomic force microscopy; A1. Substrates; A1. X ray diffraction; A3. Laser epitaxy; B2. Semiconducting II VI materials

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTAL ORIENTATION; FILM GROWTH; GROWTH RATE; LITHIUM COMPOUNDS; PULSED LASER DEPOSITION; SEMICONDUCTOR MATERIALS; SUBSTRATES; X RAY DIFFRACTION; ZINC OXIDE;

LASER EPITAXY; LATERAL GROWTH RATE; X RAY ROCKING CURVES;

OXIDE FILMS;

EID: 34247276645     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.01.029     Document Type: Article

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