Simulation of time-dependent charging of resist on Si under electron-beam irradiation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 6, 2001, Pages 2516-2519

  Kotera, Masatoshi ^a  

^a OSAKA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BOUNDARY CONDITIONS; CALCULATIONS; COMPUTER SIMULATION; ELECTRIC FIELDS; IRRADIATION; MONTE CARLO METHODS; PLASTIC FILMS; POISSON EQUATION; POLYMETHYL METHACRYLATES; SEMICONDUCTING SILICON; SUBSTRATES;

ELECTRON BEAM IRRADIATION; PRIMARY ELECTRON TRAJECTORY; SECONDARY ELECTRON CASCADE MULTIPLICATION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0035519131     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1421570     Document Type: Article

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