Monte Carlo model of charging in resists in e-beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3998, Issue , 2000, Pages 694-702

  Ko, Yeong Uk ^a   Hwu, Justin J ^a   Joy, David C ^a  

^a UNIVERSITY OF TENNESSEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CHARGE; MASKS; MATHEMATICAL MODELS; MONTE CARLO METHODS; PHOTORESISTORS;

BEAM DEFLECTION;

ELECTRON BEAM LITHOGRAPHY;

EID: 0033682953     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)