Calculation of surface potential and beam deflection due to charging effects in electron beam lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3095-3098

  Lee, Yongjae ^a   Lee, Woojin ^a   Chun, Kukjin ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CHARGE; ELECTRON EMISSION; ITERATIVE METHODS; MASKS; MONTE CARLO METHODS; POISSON DISTRIBUTION; RUNGE KUTTA METHODS; SURFACE TENSION;

ELECTRON BEAM INDUCED CONDUCTIVITY (EBIC); SURFACE POTENTIAL;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034317399     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319822     Document Type: Article

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