Laser damage resistance of silica thin films deposited by Electron Beam Deposition, Ion Assisted Deposition, Reactive Low Voltage Ion Plating and Dual Ion Beam Sputtering

Thin Solid Films

Volumn 515, Issue 7-8, 2007, Pages 3830-3836

  Gallais, L ^a   Krol, H ^a   Natoli, J Y ^a   Commandre M ^a   Cathelinaud, M ^a   Roussel, L ^a   Lequime, M ^a   Amra, C ^a  

^a AIX MARSEILLE UNIVERSITÉ   (France)

Author keywords

Evaporation; Laser damage; Optical coatings; Silicon oxide; Sputtering

Indexed keywords

ELECTRON BEAMS; EVAPORATION; LASER DAMAGE; LASERS; OPTICAL COATINGS; SILICA; SPUTTERING;

DUAL ION BEAM SPUTTERING; LASER DAMAGE RESISTANCE; LOW VOLTAGE REACTIVE ION PLATING; YAG LASERS;

THIN FILMS;

EID: 33846933550     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.011     Document Type: Article

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