Metal-dielectric light absorbers manufactured by Ion Plating

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5250, Issue , 2004, Pages 511-518

  Cathelinaud, M ^a   Lemarquis, F ^a   Loesel, J ^b   Cousin, B ^b  

^a AIX MARSEILLE UNIVERSITÉ   (France)

^b CNES   (France)

Author keywords

Ion Plating; Light absorbers; Metallic films; Thin film manufacturing

Indexed keywords

ION PLATING; LIGHT ABSORBERS; THIN FILM MANUFACTURING;

COATINGS; DEPOSITION; DIELECTRIC DEVICES; DIELECTRIC MATERIALS; METALLIC FILMS; MONOCHROMATORS; PLATING; REFRACTIVE INDEX; SILICA; THIN FILMS;

LIGHT ABSORPTION;

EID: 1942457295     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.513409     Document Type: Conference Paper

References (4)

1. F. Lemarquis, G. Marchand: "Analytical achromatic design of metal-dielectric absorbers" Appl. Opt., vol. 38, pp 4876-4884, 1999
2. M. Cathelinaud, F. Lemarquis, C. Amra: "Index determination of opaque and semi transparent metallic films. Application to light absorbers", Appl. Opt., vol. 41, pp 2546-2554, 2002
3. R. Buhl, E. Moll and H. Daxinger, U.S. Patent N°4,448,802 (1985) E. Moll, H. K. Pulker, and W. Haag, U.S. Patent N°4,619,748 (1986)
4. R. Buhl, E. Moll and H. Daxinger, U.S. Patent N°4,448,802 (1985) E. Moll, H. K. Pulker, and W. Haag, U.S. Patent N°4,619,748 (1986)