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Volumn 20, Issue 4, 2007, Pages 393-399

A fab-wide APC sampling application

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED PROCESS CONTROLS; CYCLE TIME; EVENT-BASED; MANUFACTURING PROCESS; PROCESS VARIANCES; RUN TO RUNS; SOURCES OF VARIATIONS; STATE-OF-THE-ART TECHNOLOGIES; WAFER LEVELS;

EID: 45549093219     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2007.907613     Document Type: Article
Times cited : (25)

References (10)
  • 5
    • 77957569092 scopus 로고    scopus 로고
    • A capacity-dependence dynamic sampling strategy
    • Sep. 2
    • S.-B. Lee, T.-Y. Lee, J. Liao, and Y.-C. Chang, "A capacity-dependence dynamic sampling strategy," in Proc. IEEE Int. Symp., Sep. 2, 3004, pp. 312-314.
    • Proc. IEEE Int. Symp , vol.3004 , pp. 312-314
    • Lee, S.-B.1    Lee, T.-Y.2    Liao, J.3    Chang, Y.-C.4
  • 9
    • 34748843918 scopus 로고    scopus 로고
    • Adaptive metrology sampling techniques enabling higher precision in variability detection and control
    • Jun. 11-12
    • C. Mouli and M. J. Scott, "Adaptive metrology sampling techniques enabling higher precision in variability detection and control," in Proc. IEEE/SEMI Advanced Semiconductor Manufacturing Conf., Jun. 11-12, 2007, pp. 12-17.
    • (2007) Proc. IEEE/SEMI Advanced Semiconductor Manufacturing Conf , pp. 12-17
    • Mouli, C.1    Scott, M.J.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.