Challenging the paradigm of monitor reduction to achieve lower product costs

10th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, ASMC 1999

Volumn , Issue , 1999, Pages 420-425

  Williams, R ^a   Gudmundsson, D ^b   Nurani, R ^b   Stoller, M ^b   Chatterjee, A ^b   Seshadri, S ^c   Shanthikumar, J G ^d  

^a INTEL CORPORATION   (United States)

^b KLA TENCOR CORPORATION   (United States)

^c NEW YORK UNIVERSITY   (United States)

^d UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPETITION; COST ACCOUNTING; COST EFFECTIVENESS; COSTS; DEFECTS; INDUSTRIAL RESEARCH; INSPECTION; MANUFACTURE; SEMICONDUCTOR DEVICE MANUFACTURE; STATISTICAL PROCESS CONTROL; STOCHASTIC CONTROL SYSTEMS; STOCHASTIC MODELS; STOCHASTIC SYSTEMS;

DEFECT INSPECTION; INSPECTION SAMPLING; INTEL CORPORATIONS; MONITORING AND CONTROL; RANDOM DEFECTS; SEMICONDUCTOR INDUSTRY; SEMICONDUCTOR MANUFACTURING LINE; SEMICONDUCTOR MANUFACTURING PROCESS;

COST REDUCTION;

EID: 84888805297     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.1999.798306     Document Type: Conference Paper

References (2)

1. Nurani, R K. , Akella, R. , Strojwas, A. J. "In-line Defect Sampling Methodology in Yield Managament: An Integrated Framework". IEEE Transactions on Semiconductor Manufacturing, Vol. 9, No. 4, November 1996.
2. Nurani, Raman K. , Stoller, M. , Gudmundsson, D. , and Shanthikumar, J. G. "Evaluating Inspection Strategies Using Advanced Statistical Methods ". KLA-Tencor Yield Management Solutions, Vol 1, Issue 3, Spring 1999, p. 12-14. (Available upon request from KLA-Tencor Corporation).