Critical dimension sample planning for sub-0.25 micron processes

10th Annual IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, ASMC 1999

Volumn , Issue , 1999, Pages 139-142

  Elliott, R C ^a   Nurani, R K ^a   Gudmundsson, D ^a   Preil, M ^a   Nasongkhla, R ^b   Shanthikumar, J G ^b  

^a KLA TENCOR CORPORATION   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COSTS; MANUFACTURE;

BASELINE VARIATION; CONTROL TECHNIQUES; CRITICAL DIMENSION; CRITICAL DIMENSION CONTROL; ETCH PROCESSING; OPTIMAL SAMPLING PLANS; SEMICONDUCTOR MANUFACTURING; SPEED PERFORMANCE;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 85013007355     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.1999.798202     Document Type: Conference Paper

References (4)

1. Harrison, M. W., Handbook of Statistical Methods for Engineers and Scientists, Mc Graw-Hill, 1989
2. Montgomery, D. C. and Runger, G. C., Applied Statistics and Probability for Engineers, John Wiley & Sons, 1994
3. Nurani, R. K., Akella, R., and Strojwas, A. J., "In-line Defect Sampling Methodology in Yield Management: An Integrated Framework", ZEEE Transactions on Semiconductor Manufacturing, vol. 9, no. 4, Nov 96, pages 506-5 17
4. Shanthikumar, J. G., Nasongkhla, R., Nurani, R. K., Gudmundsson, D., Elliott, R. and Preil, M., "Generalized Nested ANOVA Model for Variance Component Estimation", working paper, KLA-Tencor, 1999