Comprehensive cost-effective photo defect monitoring stratey

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 2001, Pages 67-70

  Peterson, I ^a   Stoller, M ^a   Gudmundsson, D ^a   Nurani, R ^a   Ashkenaz, S ^a   Breaux, L ^a  

^a KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDITION MONITORING; COST EFFECTIVENESS; LITHOGRAPHY; PHOTOELECTRIC CELLS;

DEFECT MANAGEMENT;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0035163164     PISSN: 1523553X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. Implementation of automated macro after develop inspection in a production lithography process
2. Tracking the performance of photolithographic processes with excursion monitoring
3. Effective defect management in the lithography cell
4. Lithography defects: Reducing and managing yield killers through photo cell monitoring