Influence of shot noise on CDU with DUV, EUV, and e-beam

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Pan, Zhih Yu ^a   Chen, Chun Kuang ^a   Gau, Tsai Sheng ^a   Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

CDU; DUV; e beam; EUV; ILS; Shot noise

Indexed keywords

COMPUTER NETWORKS; ELECTRIC NETWORK ANALYSIS; ELECTRON BEAMS; ELECTRON OPTICS; ELECTRONICS INDUSTRY; LANDING; MICROELECTRONICS; PARTICLE BEAMS; QUANTUM THEORY; SHOT NOISE; TECHNOLOGY; ULTRAVIOLET DEVICES;

(E ,2E) THEORY; ARRAY STRUCTURES; E BEAM LITHOGRAPHY; OPTICAL IMAGING; OPTICAL MICRO LITHOGRAPHY; TECHNOLOGY NODES;

ELECTRON BEAM LITHOGRAPHY;

EID: 45449115365     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.776776     Document Type: Conference Paper

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