Exploring the fundamental limit of CD control: A measurement of shot noise induced CDU in e-beam lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5835, Issue , 2005, Pages 105-114

  Yu, Ming L ^a   Sagle, Allan ^a   Buller, Benny ^a  

^a APPLIED MATERIALS INC   (United States)

Author keywords

Acid diffusion; Beam blur; CD uniformity; Resist processing; Shot noise

Indexed keywords

DATA ACQUISITION; ELECTRON BEAM LITHOGRAPHY; MATHEMATICAL MODELS; OPTIMIZATION;

ACID DIFFUSION; BEAM BLUR; CD UNIFORMITY; RESIST PROCESSING;

SHOT NOISE;

EID: 27744565133     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.637293     Document Type: Conference Paper

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