Nano-oxide fabrication on thin-films of 3d-metal compounds and alloys

Surface Science

Volumn 566-568, Issue 1-3 PART 1, 2004, Pages 349-355

  Kuramochi, H ^a,b   Tokizaki, T ^a   Onuki, T ^a   Okabayashi, J ^a,c   Mizuguchi, M ^a   Takano, F ^a   Oshima, H ^a,d   Manago, T ^a   Akinaga, H ^a   Yokoyama, H ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b SEIKO INSTRUMENTS INC   (Japan)

^c UNIVERSITY OF TOKYO   (Japan)

^d FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Atomic force microscopy; Chromium; Magnetic films; Manganese; Metal semiconductor magnetic thin film structures; Oxidation

Indexed keywords

ANODIC OXIDATION; ATOMIC FORCE MICROSCOPY; CORRELATION METHODS; FERROMAGNETIC MATERIALS; IONIC CONDUCTION; NANOSTRUCTURED MATERIALS; OXIDATION; SEMICONDUCTING GALLIUM ARSENIDE; SURFACES; THICKNESS MEASUREMENT; THIN FILMS;

FERROMAGNETIC ALLOYS; MAGANESE; METAL-SEMICONDUCTOR MAGNETIC THIN FILM STRUCTURES; THREE-DIMENSIONAL (3D) METAL COMPOUNDS;

SYNTHESIS (CHEMICAL);

EID: 4544296369     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2004.05.067     Document Type: Conference Paper

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