Sober view on extreme ultraviolet lithography

Journal of Microlithography, Microfabrication and Microsystems

Volumn 5, Issue 3, 2006, Pages

  Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Extreme ultraviolet lithography; Extreme ultraviolet mask; Extreme ultraviolet resist; Extreme ultraviolet source; Next generation lithography; Random phase shifting; Reflective imaging; Reflective mask specification

Indexed keywords

MASKS; PHASE SHIFT; PHOTORESISTS; PROJECTION SYSTEMS; REFLECTION; SPECIFICATIONS;

IMMERSION LITHOGRAPHY; RANDOM PHASE SHIFTING; REFLECTIVE PROJECTION OPTICS; ULTRAVIOLET LITHOGRAPHY;

PHOTOLITHOGRAPHY;

EID: 33845382940     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.2358112     Document Type: Article

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