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Journal of Applied Physics

Volumn 103, Issue 10, 2008, Pages

Kinetic Monte Carlo study of metal organic chemical vapor deposition growth dynamics of GaN thin film at microscopic level

(5) Fu, K a Fu, Y a Han, P b Zhang, Y b Zhang, R b

a ROYAL INSTITUTE OF TECHNOLOGY (Sweden)

b NANJING UNIVERSITY (China)

Author keywords

[No Author keywords available]

Indexed keywords

GALLIUM NITRIDE; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MONTE CARLO METHODS; REACTION KINETICS;

KINETIC MONTE CARLO METHOD; MOCVD REACTOR;

THIN FILMS;

EID: 44649186233 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2927389 Document Type: Article

Times cited : (24)

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