Validating gallium nitride growth kinetics using a precursor delivery showerhead as a novel chemical reactor

Journal of Crystal Growth

Volumn 296, Issue 1, 2006, Pages 15-26

  Parikh, Rinku P ^a   Adomaitis, Raymond A ^a   Aumer, Michael E ^b   Partlow, Deborah P ^b   Thomson, Darren B ^b   Rubloff, Gary W ^a  

^a UNIVERSITY OF MARYLAND   (United States)

^b NORTHROP GRUMMAN CORPORATION   (United States)

Author keywords

A1. Distributed parameter systems; A3. Metalorganic vapor phase epitaxy; B1. Gallium nitride

Indexed keywords

DISTRIBUTED PARAMETER SYSTEMS; GAS DELIVERY SYSTEMS; REACTANTS; REACTOR GEOMETRY;

CHEMICAL REACTORS; FUNCTION EVALUATION; MATHEMATICAL MODELS; METALLORGANIC VAPOR PHASE EPITAXY; REACTION KINETICS;

GALLIUM NITRIDE;

EID: 33749581502     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.07.031     Document Type: Article

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