Structure and properties of reactive direct current magnetron sputtered niobium aluminum nitride coatings

Journal of Materials Research

Volumn 23, Issue 5, 2008, Pages 1258-1268

  Barshilia, Harish C ^a   Deepthi, B ^a   Rajam, K S ^a   Bhatti, Kanwal Preet ^b   Chaudhary, Sujeet ^b  

^a SURFACE ENGINEERING DIVISION   (India)

^b INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

[No Author keywords available]

Indexed keywords

BIAS VOLTAGE; HARDNESS; NANOINDENTATION; NIOBIUM ALLOYS; NITROGEN; PROTECTIVE COATINGS;

NIOBIUM ALUMINUM NITRIDE COATINGS; NITROGEN FLOW RATES; SUBSTRATE BIAS VOLTAGES;

MAGNETRON SPUTTERING;

EID: 44649120204     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2008.0168     Document Type: Article

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