Effect of film chemistry on refractive index of plasma-enhanced chemical vapor deposited silicon oxynitride films: A correlative study

Journal of Materials Research

Volumn 23, Issue 5, 2008, Pages 1433-1442

  Naskar, S ^a,b   Wolter, S D ^b   Bower, C A ^a   Stoner, B R ^a,b   Glass, J T ^b  

^a RTI INTERNATIONAL   (United States)

^b Duke University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILMS; LIGHT ABSORPTION; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; X RAY PHOTOELECTRON SPECTROSCOPY;

HYDROGEN CONCENTRATION; PLASMA MIXED-FREQUENCY RATIO; SILICON OXYNITRIDE FILMS;

SILICON COMPOUNDS;

EID: 44649115221     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2008.0176     Document Type: Article

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