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Volumn 51, Issue 9, 2004, Pages 1409-1415

Separation of channel backscattering coefficients in nanoscale MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

CHANNEL BACKSCATTERING COEFFICIENTS; CHANNEL BACKSCATTERING THEORY; CHANNEL CONDUCTION BAND; GATE LENGTH; TEMPERATURE DEPENDENT DRAIN CURRENT MODEL;

EID: 4444272856     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2004.833586     Document Type: Article
Times cited : (22)

References (15)
  • 2
    • 0031191310 scopus 로고    scopus 로고
    • Elementary scattering theory of the Si MOSFET
    • July
    • M. S. Lundstrom, "Elementary scattering theory of the Si MOSFET," IEEE Electron Device Lett., vol. 18, pp. 361-363, July 1997.
    • (1997) IEEE Electron Device Lett. , vol.18 , pp. 361-363
    • Lundstrom, M.S.1
  • 5
    • 0036253371 scopus 로고    scopus 로고
    • Essential physics of carrier transport in nanoscale MOSFET's
    • Jan
    • M. S. Lundstrom and Z. Ren, "Essential physics of carrier transport in nanoscale MOSFET's," IEEE Trans. Electron Devices, vol. 49, pp. 133-141, Jan. 2002.
    • (2002) IEEE Trans. Electron Devices , vol.49 , pp. 133-141
    • Lundstrom, M.S.1    Ren, Z.2
  • 8
    • 0035250137 scopus 로고    scopus 로고
    • On experimental determination of carrier velocity in deeply scaled NMOS: How close to the thermal limit?
    • Feb
    • A. Lochtefeld and D. A. Antoniadis, "On experimental determination of carrier velocity in deeply scaled NMOS: How close to the thermal limit?," IEEE Electron Device Lett., vol. 22, pp. 95-97, Feb. 2001.
    • (2001) IEEE Electron Device Lett. , vol.22 , pp. 95-97
    • Lochtefeld, A.1    Antoniadis, D.A.2
  • 10
    • 4344632054 scopus 로고    scopus 로고
    • Velocity distribution of electrons along the channel of nanoscale MOS transistors
    • Sept
    • M. Mouis and S. Barraud, "Velocity distribution of electrons along the channel of nanoscale MOS transistors," in ESSDERC Proc., Sept. 2003, pp. 147-150.
    • (2003) ESSDERC Proc. , pp. 147-150
    • Mouis, M.1    Barraud, S.2
  • 12
    • 0031235528 scopus 로고    scopus 로고
    • Simplified method to calculate the band bending and the subband energies in MOS capacitors
    • Sept
    • H. H. Mueller and M. J. Schulz, "Simplified method to calculate the band bending and the subband energies in MOS capacitors," IEEE Trans. Electron Devices, vol. 44, pp. 1539-1543, Sept. 1997.
    • (1997) IEEE Trans. Electron Devices , vol.44 , pp. 1539-1543
    • Mueller, H.H.1    Schulz, M.J.2
  • 13
    • 36449008742 scopus 로고
    • Ballistic metal-oxide-semiconductor field effect transistor
    • Oct
    • K. Natori, "Ballistic metal-oxide-semiconductor field effect transistor," J. Appl. Phys., vol. 76, pp. 4879-4890, Oct. 1994.
    • (1994) J. Appl. Phys. , vol.76 , pp. 4879-4890
    • Natori, K.1
  • 14
    • 0028747841 scopus 로고
    • On the universality of inversion layer mobility in Si MOSFET's: Part I - Effects of substrate impurity concentration
    • Dec
    • S. I. Takagi, A. Toriumi, M. Iwase, and H. Tango, "On the universality of inversion layer mobility in Si MOSFET's: Part I - Effects of substrate impurity concentration," IEEE Trans. Electron Devices, vol. 41, pp. 2357-2362, Dec. 1994.
    • (1994) IEEE Trans. Electron Devices , vol.41 , pp. 2357-2362
    • Takagi, S.I.1    Toriumi, A.2    Iwase, M.3    Tango, H.4
  • 15
    • 3042521876 scopus 로고    scopus 로고
    • Ph.D. dissertation, Stanford Univ., Stanford, CA
    • C. Choi, "Modeling of nanoscale MOSFETs," Ph.D. dissertation, Stanford Univ., Stanford, CA, 2002.
    • (2002) Modeling of Nanoscale MOSFETs
    • Choi, C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.