In-situ stress measurement during the deposition of CNx thin films by unbalanced magnetron sputtering; formation of high levels of stress with 28 eV ion irradiation

Philosophical Magazine Letters

Volumn 84, Issue 6, 2004, Pages 395-403

  Brunell, I F ^a,d   Pichon, L ^b   Hellgren, N ^c   Czigany Zs ^a   Neidhardt, J ^a   Hultman, L ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b UMR 6630 CNRS   (France)

^c University of Illinois at Urbana Champaign   (United States)

^d NONE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

IN-SITU STRESS MEASUREMENTS; ION IRRADIATION; SP3 BONDING; UNBALANCED MAGNETRON SPUTTERING;

BENDING (DEFORMATION); BUCKLING; CARBON; DEFORMATION; ELASTIC MODULI; ELASTICITY; FILM GROWTH; FRACTURE TOUGHNESS; GRAPHITE; ION BOMBARDMENT; MAGNETRON SPUTTERING; SPUTTER DEPOSITION; STRESS ANALYSIS; TEXTURES; THIN FILMS;

FULLERENES;

EID: 4444254397     PISSN: 09500839     EISSN: None     Source Type: Journal    
DOI: 10.1080/09500830410001716140     Document Type: Article

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