Step coverage study of indium-tin-oxide thin films by spray CVD on non-flat substrates at different temperatures

Thin Solid Films

Volumn 516, Issue 17, 2008, Pages 5864-5867

  Kondo, T ^a   Sawada, Y ^a   Akiyama, K ^b   Funakubo, H ^c   Kiguchi, T ^c   Seki, S ^a   Wang, M H ^a   Uchida, T ^a  

^a TOKYO POLYTECHNIC UNIVERSITY   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

^c TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Indium tin oxide; Patterned substrates; Spray CVD; Step coverage

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DEPOSITION RATES; RAW MATERIALS; SUBSTRATES; THERMAL EFFECTS; THERMAL SPRAYING;

DEPOSITION TEMPERATURE; INDIUM-TIN-OXIDE; PATTERNED SUBSTRATES;

THIN FILMS;

EID: 44249127242     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.10.040     Document Type: Article

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