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Volumn 9, Issue 11, 2006, Pages

Conformability of ruthenium dioxide films prepared on substrates with capacitor holes by MOCVD and modification by annealing

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ASPECT RATIO; DEGRADATION; DEPOSITION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; THIN FILMS;

EID: 33748700403     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2336992     Document Type: Article
Times cited : (20)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.