Plasma-sheath expansion during plasma immersion ion implantation of insulating materials

IEEE Transactions on Plasma Science

Volumn 32, Issue 2 III, 2004, Pages 792-798

  Tian, Xiubo ^a   Fu, Ricky King Yu ^a   Chu, Paul K ^a   Yang, Shiqin ^b  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

PLASMA IMMERSION; PLASMA IMPLANTATION; SHEATH DISTORTION;

CAPACITANCE; COMPUTER SIMULATION; ELECTRIC INSULATING MATERIALS; ELECTRIC POTENTIAL; ION IMPLANTATION; MATHEMATICAL MODELS;

PLASMA SHEATHS;

EID: 4344577247     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2004.826058     Document Type: Article

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