Multiple ion-focusing effects in plasma immersion ion implantation

Applied Physics Letters

Volumn 81, Issue 20, 2002, Pages 3744-3746

  Tian, X B ^a   Chu, Paul K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; ELECTRIC FIELD EFFECTS; ELECTRIC POTENTIAL; FLUXES; FOCUSING; PARAMETER ESTIMATION; PLASMA SHEATHS; SURFACE TOPOGRAPHY;

PLASMA IMMERSION;

ION IMPLANTATION;

EID: 0037065104     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1520716     Document Type: Article

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