Enhancement of implantation energy using a conducting grid in plasma immersion ion implantation of dielectric/polymeric materials

Review of Scientific Instruments

Volumn 74, Issue 8, 2003, Pages 3697-3700

  Fu, Ricky K Y ^a   Tian, Xiubo ^a,b   Chu, Paul K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITANCE; DIELECTRIC MATERIALS; ELECTRIC CHARGE; ELECTRIC INSULATORS; ION IMPLANTATION; SEMICONDUCTOR PLASMAS;

PLASMA IMMERSION ION IMPLANTATION (PIII);

POLYMERS;

EID: 0041375588     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1588757     Document Type: Article

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