Insulator surface charging and dissipation during plasma immersion ion implantation using a thin conductive surface film

Journal of Applied Physics

Volumn 92, Issue 6, 2002, Pages 2980-2983

  Oates, T W H ^a   Bilek, M M M ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

BOHM VELOCITIES; CATHODIC ARC PLASMA; CHARGE ACCUMULATION; CONDUCTIVE SURFACES; INCIDENT IONS; INSULATOR SURFACES; METAL FILM; MINIMUM THICKNESS; PLASMA IMMERSION ION IMPLANTATION; ULTRA-THIN;

ELECTRIC FIELD EFFECTS; INSULATING MATERIALS; ION IMPLANTATION; PLASMA SHEATHS;

PLASMA APPLICATIONS;

EID: 18644362747     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1503149     Document Type: Article

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