Hydrogen-induced chemical erosion of amorphous hydrogenated carbon thin films: Structure and reactivity

Journal of Physical Chemistry B

Volumn 106, Issue 3, 2002, Pages 610-616

  Zecho, Thomas ^a   Brandner, Birgit D ^a   Biener, Jürgen ^b   Küppers, Jürgen ^a,b  

^a UNIVERSITY OF BAYREUTH   (Germany)

^b MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL EROSION; ION-BEAM DEPOSITION (IBD);

AMORPHOUS FILMS; ANNEALING; CARBON; ELECTRON ENERGY LOSS SPECTROSCOPY; EROSION; HYDROGEN; HYDROGENATION; ION BEAM ASSISTED DEPOSITION; MASS SPECTROMETRY; SINGLE CRYSTALS; THERMAL EFFECTS;

THIN FILMS;

EID: 0037165480     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp012151+     Document Type: Article

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