Novel method for absolute quantification of the flux and angular distribution of a radical source for atomic hydrogen

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 3, 2000, Pages 995-1001

  Schwarz Selinger, T ^a   Von Keudell, A ^a   Jacob, W ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; CARBON; DEUTERIUM; DISSOCIATION; HYDROGEN; MASS SPECTROMETRY; MOLECULES;

ABSOLUTE FLUX;

ATOMIC BEAMS;

EID: 0034187862     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582289     Document Type: Article

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