Study on release rate of latent heat in Czochralski silicon growth

Rare Metals

Volumn 25, Issue 6 SUPPL. 2, 2006, Pages 51-54

  REN, Bingyan ^a   YANG, Jiankun ^a   LI, Yanlin ^a   LIU, Xiaoping ^a   WANG, Minhua ^a  

^a HEBEI UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

CZSi; double heater; heat shield; latent heat; numerical simulation

Indexed keywords

COMPUTER SIMULATION; GROWTH (MATERIALS); SILICON; THERMAL EFFECTS; THERMAL INSULATING MATERIALS;

CZOCHRALSKI FURNACE; CZOCHRALSKI SILICON (CZSI); DOUBLE-HEATER; HEAT SHIELD;

LATENT HEAT;

EID: 42949136404     PISSN: 10010521     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1001-0521(08)60051-0     Document Type: Article

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