Fabrication and characterization of ultrathin double dielectric mirror GaN microcavities

Semiconductor Science and Technology

Volumn 23, Issue 4, 2008, Pages

  Bejtka, K ^a,b   Edwards, P R ^a   Martin, R W ^a   Reveret, F ^c   Vasson, A ^c   Leymarie, J ^c   Sellers, I R ^b   Leroux, M ^b   Semond, F ^b  

^a UNIVERSITY OF STRATHCLYDE   (United Kingdom)

^b CRHEA CNRS   (France)

^c UNIVERSITÉ CLERMONT AUVERGNE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

BRAGG REFLECTORS; DIELECTRIC FILMS; EPITAXIAL GROWTH; GALLIUM NITRIDE; MIRRORS; OPTICAL PROPERTIES; ULTRATHIN FILMS;

ANGLE RESOLVED REFLECTIVITY; EXCITONIC RESONANCE; OPTICAL CAVITIES; SILICON SUBSTRATES;

MICROCAVITIES;

EID: 42449097139     PISSN: 02681242     EISSN: 13616641     Source Type: Journal    
DOI: 10.1088/0268-1242/23/4/045008     Document Type: Article

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