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Volumn 3, Issue , 2006, Pages 1949-1952
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Membrane structures containing InGaN/GaN quantum wells fabricated by wet etching of sacrificial silicon substrates
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Author keywords
[No Author keywords available]
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Indexed keywords
MULTIPLE QUANTUM WELLS (MQWS);
ORGANIC VAPOUR PHASE EPITAXY;
SILICON SUBSTRATES;
WET ETCHING;
68.60.BS;
78.66.FD;
78.67.DE;
81.07.ST;
81.15.GH;
CATHODOLUMINESCENCE;
ETCHING;
GALLIUM NITRIDE;
SEMICONDUCTING INDIUM COMPOUNDS;
SUBSTRATES;
VAPOR PHASE EPITAXY;
ATOMIC FORCE MICROSCOPY;
MEMBRANE STRUCTURES;
OPTICAL PUMPING;
ORGANOMETALLICS;
PLASMA ETCHING;
SAPPHIRE;
SILICON;
SURFACE ROUGHNESS;
WET ETCHING;
SEMICONDUCTOR QUANTUM WELLS;
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EID: 33746350760
PISSN: 18626351
EISSN: None
Source Type: Journal
DOI: 10.1002/pssc.200565188 Document Type: Conference Paper |
Times cited : (3)
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References (10)
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