Surface roughness of sputtered ZnO films

Physica Scripta T

Volumn T126, Issue , 2006, Pages 68-71

  Lin, Y S ^a   Hsu, K C ^b   Huang, Y M ^c  

^a NATIONAL DONG HWA UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^c SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SURFACE ROUGHNESS; X RAY DIFFRACTION; ZINC OXIDE;

FIELD EMISSION SCANNING ELECTRON MICROSCOPY (FE-SEM); ROOT MEAN SQUARE (RMS);

THIN FILMS;

EID: 42349094282     PISSN: 02811847     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1088/0031-8949/2006/T126/016     Document Type: Conference Paper

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