Nanostructure of ZnO thin films prepared by reactive rf magnetron sputtering

Thin Solid Films

Volumn 318, Issue 1-2, 1998, Pages 117-119

  Takai, O ^a   Futsuhara, M ^b   Shimizu, G ^a   Lungu, C P ^a   Nozue, J ^b  

^a NAGOYA UNIVERSITY   (Japan)

^b Nippon Paint ^*  (Japan)

Author keywords

Microstructure; Nanostructure; ZnO film

Indexed keywords

CRYSTAL MICROSTRUCTURE; CRYSTAL ORIENTATION; FILM PREPARATION; MAGNETRON SPUTTERING; PHOTOEMISSION; SEMICONDUCTING ZINC COMPOUNDS; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

RADIO FREQUENCY MAGNETRON SPUTTERING;

SEMICONDUCTING FILMS;

EID: 0032051317     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01148-6     Document Type: Article

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